Fraunhofer ISE integrates ADE + TOPCON

Fraunhofer ISE institute to publish their TOPCON + ADE process at EUPVSEC 2021 Lisbon.

The ADE single side etching process is integrated into their TOPCON solar cell process in order to remove the parasitic poly-silicon layer and carry out the edge isolation.

Latest results will be published and presented at the conference. Scientists at Fraunhofer ISE were early adopters of the ADE dry etch process. They have been using their compact ADE tool successfully for several years, and there work have led to many related publications.


ADE100 with automated cassette load/unload



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