R&D tool

The 9s-ADE100 is a small footprint, flexible process development platform. It is built around a single ADE reactor. This reactor is similar to the one used in the industrial version of the tool, greatly facilitating the transition from laboratory development to production.

The tool can be fitted with automated loader/unloader in order to provide higher throughput. It is user friendly, and can be started very quickly, with typical etching / texturing process time duration of less than a minute. No vacuum nor plasma required, this dry etching tool is different from Reactive Ion Etching (RIE) tools. It is most relevant for all dry etching R&D work that needs to be compatible with low COO, high throughput industrial process.


Universal silicon etching/texturing solution. Enables the use of diamond wire cut wafers, epitaxial wafers, cast wafers, mono and multi crystalline. Also suitable for Si deposited layers, like amorphous silicon (a-Si) and polysilicon layers. 

Latest News

25/03/21 SiPV 2021 + nPV Workshop - conference

We will be attending the online SiPV + nPV Workshop conference, hosted by the Institute for Solar Energy Research Hamelin (ISFH) from the 19-23 of April 2021.

19/03/21 Fraunhofer ISE integrates ADE + TOPCON

Fraunhofer ISE institute to publish their TOPCON + ADE process at EUPVSEC 2021 Lisbon.

More news...

> Scalable platform : Lab to Fab

Easy process transition to industrial (multi-lanes) version of the tool

> Quick startup - Easy maintenance

Once the tool is at process temperature, the process can start and it will deliver stable results immediatly. The process gases are accurately controlled by Mass Flow Meters. As soon as the wafers come out of the tool, they can be used for the next processing step; Quick and efficient etching, for either just a few wafers, or larges batches ! The tool is also  designed for easy maintenance and acces to the chemical reactor.

> Multiple Development & Applications

>> Check our APPLICATIONS page

>> Contact us now for more information


> Compact footprint


* Shown with fully automated loaders


R&D tool


Industrial tool

Industrial ADE dry etching tool: FUTURE-PROOF SOLUTION